The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 1997

Filed:

Sep. 22, 1995
Applicant:
Inventors:

Ronald E Plasek, Houston, TX (US);

Christian Stoller, Kingwood, TX (US);

Robert A Adolph, Houston, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
E21B / ; G01V / ; G01V / ; G01V / ;
U.S. Cl.
CPC ...
364422 ; 7315202 ; 7315254 ; 175 50 ; 250253 ; 324323 ; 324332 ; 3408531 ;
Abstract

The present invention provides a new method to determine corrected characteristics of materials using the measured quantities obtained by a measurement and an extensive set of database points representing laboratory and modeled results in well defined environments. In particular the invention relates to the measurement of the characteristics of the formation around a wellbore as well as of the borehole with a well logging tool. Using a dynamic parametrization technique, the environmental corrections and the transformations from the measured to the physical characteristics can be achieved in a more accurate, robust and flexible way. The dynamic local parametrization is based on a weighted multiple linear regression over the entire database to obtain the local coefficients for the transformation which can be expressed as a simple equation.


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