The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
Oct. 24, 1996
Tamae Haruki, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method of correcting proximity effect of a pattern formed on an object is disclosed where the pattern on the object is formed by exposing a beam pattern which is created based on pattern data expressing the pattern. The method includes the steps of calculating an ideal beam-intensity profile of the beam pattern which creates the pattern on the object in a desired form, the ideal beam-intensity profile having gradual changes of a beam intensity, dividing edges of the pattern into line segments in the pattern data, the line segments being provided with displacement codes which represent at least one of first displacements of the line segments in normal directions thereof and second displacements of the line segments in extending directions of the line segments, and changing the displacement codes to displace the line segments such that a beam-intensity profile obtained from the pattern data becomes closer to the ideal beam-intensity profile.