The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
Jul. 03, 1996
Kesanao Kobayashi, Shizuoka, JP;
Masahide Yasui, Shizuoka, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Fuji-Hunt Electronics Technology Co., Ltd., Shizuoka, JP;
Abstract
A process for the preparation of an image is provided, which comprises exposing to light a layer of a composition which changes its stickiness when irradiated with active light, spraying a particulate image-forming material on to the layer, removing the particulate matter which has not been attached to the layer, and then heating the layer to fix the particulate image-forming to the substrate. This process is suitable for the patterning of not only a fluorescent substance for plasma display but also a light-impermeable or sparingly light-permeable material to which photolithography has heretofore been difficultly applied. Furthermore, the thickness of the image-forming material layer can be easily varied by properly selecting the grain diameter of the image-forming material.