The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 1997

Filed:

Nov. 24, 1995
Applicant:
Inventors:

Farzin Homayoun Azad, Clifton Park, NY (US);

David William Skelly, Burnt Hills, NY (US);

David Vincent Rigney, Cincinnati, OH (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427566 ; 427567 ; 427124 ; 4271261 ;
Abstract

A method is disclosed for operating an electron beam physical vapor deposition apparatus including a vacuum chamber containing an ingot disposed in a crucible, a workpiece disposed above the ingot, and an electron gun for emitting an electron beam to melt and vaporize the ingot to disperse vapors for deposition coating of the workpiece. The method includes directing a primary electron beam with a primary beam focus in a primary scanning pattern across a top surface of the ingot to melt and vaporize the ingot and develop an ingot melt pool floating atop an underlying ingot substrate. A secondary electron beam is superimposed across the ingot top surface in conjunction with the primary electron beam. The secondary electron beam has a secondary beam focus in a secondary scanning pattern to locally and transiently increase vaporization rate of the melt pool.


Find Patent Forward Citations

Loading…