The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
Oct. 16, 1996
Applicant:
Inventors:
William C Walsh, Archbold, OH (US);
Mark W Waldrop, Royal Oak, MI (US);
Lawrence E James, Gross Ile, MI (US);
William Monahan, Alpharetta, GA (US);
Assignee:
BASF Corporation, Mount Olive, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 12 ; 134 10 ; 134 11 ; 134 31 ; 134 37 ;
Abstract
The present invention is directed to a method of removing polymer residue from chemical processing equipment, comprising contacting said residue with NMP vapors.
Walsh, William. (1997). Method of cleaning polymer residues with nmp (U.S. Patent No. 5698045). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5698045
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile