The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1997
Filed:
May. 09, 1996
Applicant:
Inventors:
Bjorn-Owe Aronsson, Kungalv, SE;
Patrik Johansson, Goteborg, SE;
Bengt Kasemo, Mellerud, SE;
Jukka Lausmaa, Goteborg, SE;
Assignee:
Nobel Biocare AB, Gothenburg, SE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B / ; A61L / ; A61C / ;
U.S. Cl.
CPC ...
65 321 ; 65157 ; 422 23 ; 4332011 ; 623901 ;
Abstract
A method for preparing implant surfaces using gas discharge plasma including conveying the implants to a vacuum chamber. The implants are treated with an inert gas plasma to remove existing surface contamination and oxide layers from the implant surfaces. The implants are treated with an oxidizing plasma or by means of thermal oxidation to reoxidizing the implant surfaces. The implant treatment steps are carried out in a closed space, including a controlled atmosphere and produce a highly accurate and reproducible microstructure, composition, purity, and sterility in the implants.