The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 1997
Filed:
May. 22, 1996
Applicant:
Inventors:
Masaki Suzuki, Hirakata, JP;
Shoji Fukui, Takatsuki, JP;
Yuji Tsutsui, Kadoma, JP;
Shigeyuki Yamamoto, Nara, JP;
Yasuo Tanaka, Kashihara, JP;
Assignee:
Matsushita Electric Industrial Co.,Ltd., Osaka-Fu, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
1187 / ; 118728 ; 427573 ;
Abstract
In a plasma processing apparatus having an upper electrode and a lower electrode in a vacuum chamber, a substrate receiving face of the lower electrode is formed to have a same convex surface as a deflected face of a substrate on condition that surface of the substrate is freely supported on an circumference thereof, and a uniform pressure is applied to the back of the substrate.