The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 1997

Filed:

Dec. 12, 1995
Applicant:
Inventors:

George D Reese, Arlington, TX (US);

Albert R Rich, Jr, Watauga, TX (US);

Kevin K Brunson, Argyle, TX (US);

Assignee:

Tecnol Medical Products, Inc., Fort Worth, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A62B / ; A62B / ; A62B / ; A62B / ;
U.S. Cl.
CPC ...
12820619 ; 12820624 ; 12820621 ; 12820711 ;
Abstract

A face mask is provided that includes a filter body capable of filtering liquids, particles and aerosols of a size appropriate for the mask's intended purposes, while providing excellent breathability and comfort for extended periods of time. The filter body may be formed from multiple layers of filtration material having a generally rectangular configuration with a plurality of pleats. The mask may be secured to the head of a wearer by tie strips attached to flaps extending from the filter body to form a fluid seal between the periphery of the mask and the wearer's face. For some applications, the flaps may be formed from resilient or stretchable material which further enhances both the fluid seal formed by the mask and comfort for the wearer. A clear visor may also be attached to the mask to protect the wearer's eyes and portions of the wearer's face not covered by the mask.


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Reese, George. (1997). Face mask with enhanced seal and method (U.S. Patent No. 5694925). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5694925

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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