The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 1997

Filed:

Jun. 05, 1995
Applicant:
Inventor:

John MacPhee, Rowayton, CT (US);

Assignee:

Baldwin Graphics Systems, Inc., Shelton, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F / ;
U.S. Cl.
CPC ...
101148 ;
Abstract

A system for supplying dampening fluid to a lithographic press dampening system. The system prevents dampening fluid starvation at a metering nip located between dampening system rollers, and minimizes contamination of the dampening fluid in the dampening system. A pre-determined distance is maintained between (1) the surface of a roller partially immersed in dampening fluid and (2) a fluid collection pan, so as to remove contaminants from the system. Sensors are used to determine the proper level of dampening fluid within the system to avoid nip starvation.


Find Patent Forward Citations

Loading…