The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 1997

Filed:

Dec. 26, 1995
Applicant:
Inventors:

Joseph Kenneth Maier, Milwaukee, WI (US);

Frederick Howard Epstein, Elm Grove, WI (US);

Xiaohong Zhou, Franklin, WI (US);

Lawrence Edward Ploetz, Brookfield, WI (US);

Paul E Licato, Wauwatosa, WI (US);

Assignee:

General Electric Company, Milwaukee, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01V / ;
U.S. Cl.
CPC ...
324309 ; 324307 ;
Abstract

An off-center NMR image is produced using an EPI pulse sequence. The offset along the readout gradient axis is achieved by shifting the frequency of an RF reference signal used to demodulate the received NMR echo signals. Phase errors produced by the NMR system and by the shifts in reference signal frequency are corrected in 'real time' by also shifting the phase of the RF reference signal.


Find Patent Forward Citations

Maier, Joseph. (1997). Method for producing an off-center image using an epi pulse sequence (U.S. Patent No. 5689186). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5689186

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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