The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 1997

Filed:

Aug. 01, 1996
Applicant:
Inventors:

Roger Alan Emigh, Post Falls, ID (US);

William Bryce Willett, Veradale, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21D / ;
U.S. Cl.
CPC ...
72 69 ; 72 82 ; 20429812 ;
Abstract

Described is a method of manufacturing a sputtering target or backing plate for a sputtering target that minimizes metal waste and reduces manufacturing steps. The target or backing plate is made from a substantially circular metal blank by progressively deforming circumferential bands until the blank is in the shape of a sputtering target or backing plate. The target and backing plate so produced are also described.


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