The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 1997
Filed:
Mar. 06, 1996
Applicant:
Inventors:
John H Shannon, Hamlin, NY (US);
Kevin J McIntyre, Rochester, NY (US);
Assignee:
Bausch & Lomb Incorporated, Rochester, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912169 ; 21912178 ; 606-5 ; 1283031 ;
Abstract
Laser radiation can be directed through an aperture to a target surface without causing the expected diffraction groove effect by moving the target relative to the stage to which the aperture is attached in such a fashion as to interrupt the diffraction pattern and minimize the production of diffraction grooves.
Shannon, John. (1997). Method of minimizing diffraction groove formation on laser etched (U.S. Patent No. 5685998). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5685998
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile