Apparatus for cleaning and drying hard disk substrates

Abstract

An apparatus for cleaning and then drying batches of hard disk substrates includes a substrate cleaning station and a substrate drying station. The substrate cleaning station includes a first index table supporting thereon at least three circumferentially spaced first substrate carriers on which hard disk substrates are mounted respectively. The substrate drying station includes a second index table disposed rearward of the first index table and supporting thereon at least three circumferentially spaced second substrate carriers on which cleaned hard disk substrate are mounted, respectively. Upon rotation of the first index table, each of the first substrate carriers moves successively through a substrate mounting position, a substrate cleaning position and a substrate removing position. Likewise, upon rotation of the second index table, each of the second substrate carriers moves through a substrate mounting position, a substrate drying position and a substrate removing position. Thus, a series of hard disk substrates supplied to the substrate cleaning station are cleaned at the substrate cleaning station and then dried at the substrate drying station, and after than the dried substrates are removed in succession from the substrate drying station.