The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 1997

Filed:

Jan. 25, 1996
Applicant:
Inventor:

Pieter K De Bokx, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
378 45 ; 378 44 ;
Abstract

A method for GE-XRF (Grazing Exit X-Ray Fluorescence) with high spatial resolution in the direction parallel as well as perpendicular to the specimen surface. The specimen (2) to be examined is irradiated by means of an X-ray beam having a cross-section which is substantially larger than the surface region to be examined. This beam irradiates a large number of parts of the specimen surface and the respective radiation thus excited is measured each time. From all measurements the intensity of the radiation excited by individual pixels in the specimen is calculated by means of a suitable algorithm. The advantage of this method resides in the fact that an X-ray source having a very high intensity (for example, a synchrotron) can be dispensed with and suitable spatial resolution is achieved nevertheless.


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