Exposure apparatus and device manufacturing method for projecting light

Abstract

An exposure apparatus includes a light source, first, second and third optical integrators disposed along an optical axis, for receiving light from the light source, each of the integrators having lens elements arrayed in a direction perpendicular to the optical axis, a first condensing optical system for directing, onto the third optical integrator, light passed through the first and second optical integrators, to form a secondary light source through the third optical integrator, a device for relatively shifting the second optical integrator relative to the first optical integrator, in the direction perpendicular to the optical axis, a second condensing optical system for receiving light from the secondary light source and directing the light to a mask, and a projection optical system for projecting an image of a pattern of the mask irradiated with the light from the secondary light source onto a substrate. Also disclosed are device manufacturing methods in which light, passed through first and second lens arrays, which are disposed along an optical axis, form a secondary light source and a device pattern is illuminated with light from the secondary light source whereby the device pattern is transferred to a substrate.