The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 1997

Filed:

Jun. 05, 1995
Applicant:
Inventors:

Ryuji Sugita, Hirakata, JP;

Kiyokazu Tohma, Hirakata, JP;

Tatsuaki Ishida, Sakai, JP;

Kazunari Yoshimoto, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ;
U.S. Cl.
CPC ...
427523 ; 427525 ; 427529 ; 427531 ; 427566 ; 427128 ; 427585 ; 4272481 ; 427251 ; 4272555 ; 118718 ; 1187 / ; 118724 ;
Abstract

A thin film magnetic recording medium is manufactured with vacuum deposition or sputtering technique. One or more reflectors are provided between the substrate and an evaporation source around a path through which evaporated atoms travel onto a substrate. When a thin film is deposited on a substrate, the one or more reflectors are heated above a melting point of an evaporation material to reflect evaporated atoms arriving them. Thus, atoms reflected by the one or more reflectors also contribute to deposition of a thin film as well as evaporated atoms arriving directly from the evaporation source, and deposition efficiency is improved. Such a reflector is also used to limit a boundary or the path through which evaporated atoms travel onto a substrate. Then, a range of incident angles of evaporated atoms onto the substrate is kept the same for a long time on deposition, and characteristics of the thin film are stable.


Find Patent Forward Citations

Loading…