The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 1997

Filed:

Jun. 27, 1996
Applicant:
Inventors:

Dante Patrick Bonaquist, Grand Island, NY (US);

Susan Marie Sattan, Amherst, NY (US);

Assignee:

Praxair Technology, Inc., Danbury, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25J / ;
U.S. Cl.
CPC ...
62650 ; 62654 ;
Abstract

A double column cryogenic rectification system for producing low purity oxygen and high purity nitrogen, preferably at elevated pressure, wherein nitrogen-rich vapor from the higher pressure column is turboexpanded and condensed against lower pressure column intermediate liquid prior to being passed into the lower pressure column.


Find Patent Forward Citations

Bonaquist, Dante. (1997). Cryogenic rectification system for producing low purity oxygen and high (U.S. Patent No. 5678427). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5678427

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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