The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 1997
Filed:
Feb. 23, 1995
Tetsuya Oshino, Kamakura, JP;
Nikon Corporation, Tokyo, JP;
Abstract
The present invention relates to an illuminating apparatus for illuminating an illuminated object in an arcuate pattern and, more particularly, to an illuminating apparatus suitably applicable to exposure apparatus suitably used in transferring a circuit pattern on a photomask (mask or reticle) through a reflection type imaging apparatus onto a substrate such as a wafer by the mirror projection method, for example of an X-ray optical system. The illuminating apparatus of the present invention can illuminate the illuminated surface in an arcuate pattern with uniform intensity. Exposure apparatus provided with the illuminating apparatus of the present invention can obtain an image with uniform exposure over the entire arcuate surface as the illuminated surface, so that the pattern on the mask located on the illuminated surface can be accurately transferred with high throughput onto the substrate.