The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 1997
Filed:
Apr. 25, 1995
John Edwin Graebner, Short Hills, NJ (US);
Sungho Jin, Millington, NJ (US);
Guenther Wilhelm Kammlott, Watchung, NJ (US);
Wei Zhu, North Plainfield, NJ (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
A novel technique for fine polishing surfaces of diamond to the submicron level involves applying to the diamond surface an oxygen-emitting polishing medium, either a dry powder or a powder dispersed in a liquid carrier. The diamond surface is then polished by high speed rubbing to a submicron finish by inducing oxygen emission and oxygen-carbon interaction. Several embodiments of apparatus for polishing are described.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile