The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
Jul. 14, 1995
Michio Oka, Kanagawa, JP;
Hiroshi Suganuma, Ibaragi, JP;
Sony Corporation, Tokyo, JP;
Abstract
A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates light with fourth harmonics which are scanned by a scanning lens 2 and reflected and swept by a polygonal mirror 3. A cylindrical reflecting mirror radiates the sweeping fourth harmonics reflected by the polygonal mirror 3 onto an arcuate aperture formed in a light exposure mask. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected onto a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.