The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
Apr. 25, 1996
Xiaohong Zhou, Franklin, WI (US);
Joseph K Maier, Milwaukee, WI (US);
Frederick H Epstein, Gaithersburg, MD (US);
General Electric Company, Milwaukee, WI (US);
Abstract
In a magnetic resonance imaging (MRI) system, a method is provided for reducing oblique Nyquist ghost artifact in an image produced by an oblique EPI scan. Prior to commencing the EPI scan, referencing pre-scans are conducted to generate pre-scan echo trains respectively corresponding to the physical gradient axes. Distortion compensating parameters are derived from the pre-scan echo trains for reducing Nyquist ghost by alternatively modifying the data acquisitions stage of the oblique EPI scan, or the post-data acquisition image processing stage thereof. In one mode of operation, the pre-scan echo trains are generated while a subject is in the MRI system. In another mode of operation, pre-scan echo trains are generated while no subject is present in the MR system, so that the distortion compensating parameters represent characteristics of the MR system only, and thus may be used for EPI scans of different protocols. For such mode of operation the distortion compensating parameters may be computed as a function of readout gradient pulse spacing.