The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
Jun. 07, 1995
Applicant:
Inventors:
Mario Joseph Nappa, Newark, DE (US);
Klaus Guenter Wuttke, Wilmington, DE (US);
Assignee:
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
570168 ; 570248 ;
Abstract
A process is disclosed for producing 1,1-difluoroethane (CH.sub.3 CHF.sub.2 or HFC-152a) in a two-step reaction in a manner that reduces formation of high boiling materials. The first step comprises adding at least one of HCl or HF to chloroethene (CH.sub.2 .dbd.CHCl) in order to obtain at least one of 1,1-dichloroethane (CH.sub.3 CHF.sub.2) or 1-chloro-1-fluoroethane (CH.sub.3 CHClF). The second step comprises converting 1,1-dichloroethane or 1-chloro-1-fluoroethane to 1,1-difluoroethane.