The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1997
Filed:
May. 29, 1996
Applicant:
Inventors:
Thomas R Anthony, Schenectady, NY (US);
William F Banholzer, Columbus, OH (US);
Clifford L Spiro, Niskayuna, NY (US);
Steven W Webb, Worthington, OH (US);
Bradley E Williams, Worthington, OH (US);
Assignee:
General Electric Company, Pittsfield, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427444 ; 427249 ; 427577 ; 4273722 ;
Abstract
A method for treating as as-grown chemical vapor deposited (CVD) starting diamond film having stresses and containing voids, comprises the step of subjecting the diamond film to a temperature of above about 1000.degree. C. and a hydrostatic pressure of above about 3 kilobars.
Anthony, Thomas. (1997). Method for enhancing the toughness of cvd diamond (U.S. Patent No. 5672395). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5672395
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile