The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 1997
Filed:
Sep. 26, 1995
Applicant:
Inventor:
Christopher R Needham, Beverly, MA (US);
Assignee:
Polaroid Corporation, Cambridge, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437-3 ; 216 26 ;
Abstract
Microlenses are formed on a solid state imager comprising a substrate having planar radiation-sensitive regions and upstanding electrode regions by forming a conformal layer of a first, low refractive index material on the substrate, and forming a planarized layer of a second, higher refractive index material on top of the layer of first material. The portions of the second material extending down between the upstanding electrode regions act as microlenses deflecting light which would otherwise fall on the radiation-insensitive electrode regions on to the radiation-sensitive regions, thus improving the quantum efficiency of the imager.