The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 1997
Filed:
Jun. 07, 1995
Applicant:
Inventors:
Fumiyoshi Urano, Kawagoe, JP;
Hirotoshi Fujie, Kawagoe, JP;
Keiji Oono, Kawagoe, JP;
Takaaki Negishi, Kawagoe, JP;
Assignee:
Wako Pure Chemical Industries, Ltd., Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430326 ; 430170 ; 4302701 ; 430330 ; 430907 ; 430909 ; 430942 ;
Abstract
A resist composition comprising (a) a polymer having at least repeating units of the formulae: ##STR1## (b) a photoacid generator and (c) a solvent, has high sensitivity to light, excellent heat resistance, adhesiveness to a substrate and suitable for pattern formation with high resolution.