The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 1997

Filed:

Mar. 19, 1996
Applicant:
Inventors:

Scott Eugene Solberg, Santa Rosa, CA (US);

Richard Ian Seddon, Santa Rosa, CA (US);

Bradley James Pond, Santa Rosa, CA (US);

William Thomas Beauchamp, Santa Rosa, CA (US);

Assignee:

Optical Coating Laboratory, Inc., Santa Rosa, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419226 ; 20419223 ; 20419227 ; 20429811 ;
Abstract

The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.


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