The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1997
Filed:
Jun. 04, 1996
Applicant:
Inventors:
Chitra K Subramanian, Austin, TX (US);
James D Hayden, Austin, TX (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438282 ; 438526 ; 438532 ; 438595 ;
Abstract
A process for fabricating an MOS device (44) having a segmented channel region (48) includes the fabrication of a compound MOS gate electrode (46). Both the segmented channel region (48) and the MOS gate electrode (46) are formed by creating an opening (18) and an insulating layer (16) overlying a first polycrystalline silicon layer (14). The lateral extent of both the MOS gate electrode (46) and a buried junction region (24) formed in the semiconductor substrate (10) are defined by first sidewall spacer (22) and a second sidewall spacer (32) formed adjacent to the first sidewall spacer (22).