The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1997
Filed:
Mar. 11, 1996
Applicant:
Inventors:
Carl A Chiulli, Randolph, MA (US);
John E MacLatchy, Dover, NH (US);
Harris R Miller, Boston, MA (US);
Assignee:
Polaroid Corporation, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; G02F / ; G03F / ;
U.S. Cl.
CPC ...
430-7 ; 430321 ; 349106 ; 257440 ;
Abstract
A substrate (typically a solid state imager or a liquid crystal display device) is provided with a filter by forming a layer of photoresist on the substrate, and exposing and developing the photoresist to produce filter elements from the portions of the layer of photoresist remaining after the development. After development of the layer of photoresist, the substrate is treated with a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the substrate. A preferred silylation compound is hexamethylcyclotrisilizane.