The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1997
Filed:
Jun. 24, 1996
Shigeki Miyazaki, Kanagawa, JP;
Atsushi Seki, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A discharge chamber wherein incomplete discharge arising from a discharge electrode surface condition is suppressed and a manufacturing method for the discharge chamber are disclosed. The discharge chamber includes a first substrate, a plurality of discharge electrodes formed on a surface of the first substrate by printing and baking, a second substrate adhered to the first substrate with a predetermined gap left therebetween, and ionizable gas enclosed in the gap. The discharge electrodes have clean surfaces from which insulating substances have been removed, and have a uniform composition in a horizontal direction and a depthwise direction. A plurality of barrier ribs are formed between the first and second substrates by printing and baking such that they overlap partially with the discharge electrodes. Insulating substances which make an obstacle to plasma discharge have been removed from exposed portions of the discharge electrodes at which the discharge electrodes are not covered with the barrier ribs.