The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 1997

Filed:

May. 16, 1996
Applicant:
Inventors:

Satoru Tachihara, Tokyo, JP;

Koichi Maruyama, Tokyo, JP;

Tetsuya Nakamura, Tokyo, JP;

Takashi Okuyama, Tokyo, JP;

Tamihiro Miyoshi, Tokyo, JP;

Shinichi Suzuki, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; B41J / ;
U.S. Cl.
CPC ...
396548 ; 347241 ;
Abstract

For an aperture plate to be used to form dot images of a two dimensional aperture pattern by projection through an imaging optical system in a normal direction, a pattern of markings in ideal positions is projected through an imaging optical system in the reverse direction to normal imaging operations. The image of the pattern is recorded at the position of the aperture plate, and the recorded image is used as a guide to form corrected apertures in the aperture plate. Accordingly, locational errors of the dot images in the normal direction are corrected when the corrected aperture plate is used.


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