The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 1997

Filed:

Apr. 26, 1995
Applicant:
Inventors:

Tony D Beckett, Dayton, OH (US);

Larry D Holden, Bellbrook, OH (US);

David R Seitz, Vandalia, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41C / ;
U.S. Cl.
CPC ...
358299 ;
Abstract

This system and method relates to an engraving system and method for engraving a pattern using a plurality of engraving devices. The engraving system discloses apparatus and method for sequencing and engraving of the plurality of engraving devices such that when the areas engraved by those heads meet to provide a continuous engraved pattern. The system and method utilizes an imaging system for imaging the engraved areas associated with each engraving head so that the heads or signals driving the heads may be adjusted to further facilitate providing engraved areas which appear as if they had been engraved by a single engraving head when, for example, the engraved area of one head meets the engraved area of another head. Also, disclosed is a method for sequencing and transmitting image data associated with an image to be engraved in order to accommodate any cylindrical offset or the angular displacement between, for example, two engraving heads that are positioned in a generally opposed relationship.


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