The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 1997
Filed:
Jul. 11, 1995
Applicant:
Inventors:
Chun-Shan Wang, Tainan, TW;
Yih-Min Sun, Tainan, TW;
Assignee:
National Science Council, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
525285 ; 525436 ; 525437 ; 528176 ; 528190 ; 528191 ; 528194 ; 528195 ;
Abstract
The present invention relates to a random copolyester containing naphthalene ring structure, in particular to a random copolyester containing a first repeating unit which is the same as that of polyalkylene naphthalate, such as polyethylene naphthalate (PEN) and polybutylene naphthalate (PBN), and a second repeating unit which is similar to the first repeating unit except that an aryl ether linkage is incorporated thereto. The present copolyester can be prepared from a dihydroxyethoxy compound and bis(hydroxyalkyl)naphthalate via a direct melt polycondensation in the presence of a metallic catalyst.