The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 1997
Filed:
Feb. 20, 1996
Yun Chea Chang, Rochester, NY (US);
Rajesh Vinodrai Mehta, Rochester, NY (US);
Lois Ann Buitano, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A radiation-sensitive emulsion is disclosed in which greater than 50 percent of total grain projected area is accounted for by tabular grains (a) having {100} major faces, (b) containing greater than 50 mole percent chloride, based on silver, (c) having a mean equivalent circular diameter in the range of from 2.0 to 5.0 .mu.m, and (d) exhibiting a mean thickness of 0.1 .mu.m or less. The emulsion is prepared by (a) precipitating up to 10 percent of the total silver forming the high chloride {100} tabular grains to create a first grain population under conditions that form a crystal lattice structure that favors the growth of high chloride {100} tabular grains, (b) thereafter rapidly introducing silver and halide ions to create a second grain population, and (c) growing the first grain population to create the high chloride {100} tabular grains by ripening out the second grain population.