The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 1997
Filed:
Jan. 12, 1994
Tetsuro Fukui, Kawasaki, JP;
Masato Katayama, Yokohama, JP;
Kozo Arahara, Kawasaki, JP;
Hiroshi Fukumoto, Kawasaki, JP;
Yoshio Takasu, Tama, JP;
Kenji Kagami, Atsugi, JP;
Akihiro Mouri, Atsugi, JP;
Kazuo Isaka, Tokyo, JP;
Kyo Miura, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Oriental Photo Industrial Co., Ltd., Tokyo, JP;
Abstract
A photosensitive material comprises a photosensitive composition comprising a photosensitive and heat-developable element and a photopolymerizable element. An imagewise unexposed area on the material is polymerized by imagewise exposure, heating and whole areal exposure. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent of the formula ##STR1## The photopolymerizable element comprises at least a polymerizable polymer precursor and a photopolymerization initiator. An image forming method comprises the steps; subjecting a photosensitive material in the same layer to imagewise exposure and heating to form an image; and subjecting the resultant photosensitive material to whole areal exposure to polymerize and imagewise unexposed or exposed area thereof.