The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 1997

Filed:

Jul. 22, 1996
Applicant:
Inventors:

Eiji Fujii, Osaka, JP;

Yasuhiro Shimada, Osaka, JP;

Yasuhiro Uemoto, Osaka, JP;

Tooru Nasu, Kyoto, JP;

Akihiro Matsuda, Osaka, JP;

Tatsuo Ootsuki, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01G / ;
U.S. Cl.
CPC ...
257295 ; 257306 ; 257310 ; 365145 ; 365149 ;
Abstract

This is a semiconductor device having an integrated circuit and a capacitor formed on a semiconductor substrate. The capacitor comprises a bottom electrode serving also as a part of a diffusion layer of the integrated circuit, a dielectric film being formed on the bottom electrode, and a top electrode of a conductive film being formed on the dielectric film. In particular, it is preferred to form the dielectric film in two layers of dielectric film, and compose the dielectric film contacting with the bottom electrode of a dielectric material in a composition possessing an excess of a metal element than the stoichiometric composition.


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