The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
May. 06, 1996
Applicant:
Inventors:
Wayne D Kimura, Bellevue, WA (US);
Ralph B Fiorito, Silver Spring, MD (US);
Donald W Rule, Silver Spring, MD (US);
Assignee:
STI Optronics, Inc., Bellevue, WA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250397 ; 250305 ; 250310 ;
Abstract
A method and apparatus for detecting diffraction radiation from a charged particle beam in order to measure parameters that characterize the charged particle beam. The charged particle beam passes near one or more edges, apertures, or interfaces between media of different dielectric constants such that the beam is not intercepted. This generates forward diffraction radiation and reflected diffraction radiation at an angle relative to the direction of the beam. The radiation passes through a focusing system and onto a detector which measures a desired parameter.