The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
Mar. 14, 1995
Hideto Kiyama, Tokyo, JP;
Tamotu Iwata, Tokyo, JP;
Yukinao Kawamata, Tokyo, JP;
Susumu Baba, Tokyo, JP;
Mitsubishi Paper Mills Limited, Tokyo, JP;
Abstract
Disclosed is a method for developing silver halide photographic photosensitive materials with a developer containing a sulfite wherein said developer contains 20 mol % or more of potassium ion based on the total alkali metal ions, 0.04 mol/l or more of bromine ion or a compound represented by the following formula (I): ##STR1## wherein R.sub.1 represents a hydroxyalkyl group having 2-10 carbon atoms and R.sub.2 and R.sub.3 each represent a hydrogen atom, an alkyl group having 1-10 carbon atoms or a hydroxyalkyl group having 2-10 carbon atoms and the developer is filtered by a filter containing physical development nuclei before, during or after development of the photosensitive materials with the developer. The method is especially effective in processing using an automatic processor. According to the present method, formation of silver sludges is effectively inhibited and thus, stain of roll and belt of the processors can be prevented. According to the present method, formation of silver sludges is effectively inhibited and thus, stain of roll and belt of the processors can be prevented.