The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Apr. 26, 1995
Toshikazu Sakai, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for manufacturing semiconductors is provided in order to make stages for carrying a wafer compact and to increase their rigidity. The apparatus has an exposure optical system, stages for carrying a wafer, a section for moving the stages relative to the exposure optical system, and first and second measurement sections. The first measurement section measures the positions of the stages, including the positions of the stages when the wafer is exposed to incident radiation. The second measurement means measures at least the positions of the stages at a wafer replacement position, where the first measurement means cannot be used for measurement.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile