The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Apr. 17, 1996
Hsien-Kuang Lin, Taipei, TW;
Industrial Technology Research, Institute, Hsin chu, TW;
Abstract
An improved method for making color filter plates from anionic electrocoats is disclosed. It comprises the steps of: (a) forming a positive photoresist layer on an electrically conductive transparent glass substrate; (b) exposing the portions of the glass substrate to be electrodeposited with a designated color electrocoat by removing corresponding portions of the positive photoresist layer using a photomasked light exposure procedure followed by a development procedure with a developer solution; (c) electrodepositing the designated color electrocoat on the exposed portions of the glass substrate; (d) performing a flood exposure on remaining portions of the positive photoresist; (e) performing a postbake procedure by heating the glass substrateto thereby harden the color electrocoat; (f) using a basic developer solution to remove the remaining portions of the positive photoresist; and (g) repeating steps (a) through (f) until all the desired electrocoats are electrodeposited on the glass substrate. The flood exposure step causes the photoresist to undergo a chemical reaction so that it will not crosslink during the postbake step and thus can be readily removed in step (f).