The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Jun. 05, 1995
Nobuhiko Yukawa, Akashi, JP;
Katsuhiko Sakamoto, Takatsuki, JP;
Kozo Nogi, Takatsuki, JP;
Naofumi Tsujino, Yao, JP;
Nippon Shokubai Co., Ltd., Osaka, JP;
Abstract
Provided is a method for continuously forming a synthetic stone having a thickness with a high degree of accuracy, without using a complicated apparatus, in which resin compound is filled between belt-like upper and lower films in two layers running horizontally on a band-like floor, upstream thereof, so as to continuously form the synthetic stone, a regulating plate 31 is disposed above the band-like floor 3 and downstream of the resin filling part, and the resin compound (R) is continuously filled in a condition in which the gap between the regulating plate and the band-like floor 3 and is set to a predetermined value. Further, the filling volume of the resin compound is adjusted in accordance with a variation in the thickness of the formed resin plate having passed through the regulating plate.