The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Dec. 13, 1995
Allan E Schultz, St. Paul, MN (US);
L Vincent Ruscello, Burnsville, MN (US);
William H Nunne, Burnsville, MN (US);
Seagate Technology, Inc., Scotts Valley, CA (US);
Abstract
A diamond-like carbon mask is formed on the surface of the magnetic material for ion-milling the magnetic material into a magnetic pole of a transducer. The mask is formed by depositing a layer of diamond-like carbon over the magnetic material. Successive layers of photoresist, SiO.sub.2 and photoresist are applied over the magnetic material. The second layer of photoresist is patterned in the shape of the pole being formed. The exposed insulating layer is etched with an etchant that does not attack the diamond-like carbon, the exposed portions of the photoresist are exposed and removed, and the exposed portion of the diamond-like carbon is etched with an oxygen etchant. The remaining photoresist is washed away to remove the remaining insulating material. In one form of the invention, a layer of SiO.sub.2 may additionally be formed over the diamond-like carbon to protect the diamond-like carbon from being affected by any undercut of the photoresist by the oxygen etchant. The SiO.sub.2 layer is etched prior to etching the diamond-like carbon. The mask is used to ion mill the magnetic material to the desired pole.