The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1997
Filed:
Mar. 07, 1996
James Van Gogh, Sunnyvale, CA (US);
Fernand Dorleans, San Francisco, CA (US);
Christopher Hagerty, Pleasanton, CA (US);
Mark Lloyd, Fremont, CA (US);
Howard Tang, San Jose, CA (US);
Siyaun Yang, Cupertino, CA (US);
R Steve West, Boulder Creek, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The disadvantages heretofore associated with the prior art are overcome by the present invention of an improved target for a physical deposition (PVD) system. The improved target has a portion of the target side wall the overhangs and shadows the side wall of the target thus preventing material from depositing on the edge. To further reduce contaminant generation, the improved target is combined with an improved dark space shield having a first end and a second end, where the second end conventionally supports a collimator and the first end has an inner surface that is substantially vertical.