The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 1997

Filed:

Jul. 02, 1991
Applicant:
Inventors:

Kenichi Gomi, Hitachi, JP;

Hideaki Tanaka, Katsuta, JP;

Hiroyuki Sugimoto, Hitachi, JP;

Shoichi Sawahata, Hitachi, JP;

Masaki Ohura, Odawara, JP;

Yoshihiko Miyake, Odawara, JP;

Yoshiki Kato, Tokyo, JP;

Hiroshi Yashiki, Odawara, JP;

Youichi Inomata, Odawara, JP;

Yoshihiro Moriguchi, Hiratsuka, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ; B05D / ;
U.S. Cl.
CPC ...
428 653 ; 428 655 ; 428141 ; 4286 / ; 4286 / ; 4286 / ; 4286 / ; 428900 ; 427130 ; 427131 ; 427128 ; 2041921 ; 20419232 ; 20419235 ;
Abstract

A magnetic disk has a magnetic layer and a protective layer disposed on the magnetic layer. A multiplicity of lands having sizes within a predetermined range of sizes and generally equal heights within a predetermined range are formed on the surface of the protective layer at a density within a predetermined range. The lands serve to effectively remove contaminants attached to the floating surface of a magnetic head to ensure a desired sliding reliability and floating stability of the head during a long period of time even in the case of a high-density magnetic disk apparatus in which the extent of floating of the head is small. The reliability with which the magnetic disk apparatus operates is thereby improved. The lands are formed on the surface of the protective layer by a process of forming a mask of fine particles on the protective layer surface and etching the protective layer surface through this mask.


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