The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 1997
Filed:
Dec. 05, 1995
Applicant:
Inventors:
Prabhakar P Tripathi, San Jose, CA (US);
Bruce Whitefield, Menlo Park, CA (US);
Chi-Hung Wang, San Jose, CA (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
364489 ; 364488 ;
Abstract
A method of interactive feedback in semiconductor processing is provided which compensates for lithographic proximity effects, reactive ion etch loading effects, electromigration and stress due to layering.
Quick Actions:
Tripathi, Prabhakar. (1997). Method and structure for improving patterning design for processing (U.S. Patent No. 5654897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5654897
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile