The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 1997
Filed:
Feb. 22, 1996
Christian Moreau, Boucherville, CA;
Patrick Gougeon, Boucherville, CA;
Mario Lamontagne, Ville Lemoyne, CA;
National Research Council of Canada, Ottawa, CA;
Abstract
In a method of monitoring in-flight particles, a mask in a is placed in a plane generally parallel to the direction of travel of the particles. The mask defines at least two slits that are generally parallel and lie in a direction having at least a component at right angles to the direction of travel. The slits have their ends offset relative to each other. The slits radiation emitted, scattered or absorbed by the particles is monitored as they traverse the slits field of view. The particles for which the radiation, emitted, scattered or absorbed which is collected through each slit as they sequentially traverse said slits bears a predetermined relationship are identified, and the size of the identified particles is determined from the amount of radiation emitted, scattered or absorbed as the identified particles traverse the slits.