The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 1997
Filed:
Jul. 06, 1995
David B Taub, Guilford, CT (US);
Entoleter, Inc., Hamden, CT (US);
Abstract
Apparatus for scrubbing a gas in which a vortical flow of a gas and liquid mixture created by an entrainer is introduced into a de-entrainer through a guide/deflector assembly. Particulate is removed from the gas and picked up by the liquid during entrainment. De-entrainment separates the liquid from the gas and delivers the scrubbed gas to an outlet. A conical top provided upon the primary de-entrainer prevents water droplets, which also contain particulate from being re-entrained with the scrubbed gas and further serves to deflect the droplet toward the sides of the de-entrainer where they may be collected, filtered and returned to the entrainer, thereby significantly increasing contaminant removal from the gas stream. Anti-spin plates are provides at spaced angular interval just upstream of the scrubbed gas outlet which break the vortex of air formed by the primary de-entrainer which serves to remove additional droplets and water vapor by mechanical condensation and agglomeration increasing efficiency of contaminant removal and further reducing the pressure drop required to move air out of the scrubber and into the atmosphere. The reduced pressure drop makes more effective use of the pressure in the dirty gas region thus further improving efficiency.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile