The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 1997
Filed:
Oct. 02, 1990
Yuichi Kokaku, Yokohama, JP;
Hiroyuki Kataoka, Pallo Alto, CA (US);
Makoto Kitoh, Yokohama, JP;
Shigehiko Fujimaki, Machida, JP;
Satoshi Matsunuma, Yokohama, JP;
Kenji Furusawa, Yokohama, JP;
Nobuo Nakagawa, Yokohama, JP;
Katsuo Abe, Yokosuka, JP;
Masaaki Hayashi, Odawara, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus comprising: a vacuum container; an evacuation means for keeping the interior of the vacuum container at a pressure not higher than atmospheric pressure; a substrate support device for supporting a substrate to be subjected to plasma processing; an electrode for generating plasma in cooperation with the substrate support; a voltage supply for applying a voltage to the electrode; a gas introducing system for introducing a gaseous material into a space where the plasma is produced; a surrounding member for enclosing the space above the substrate support, and a drive for relatively moving the surrounding member to space an end of the surrounding member proximate from the substrate from at least one of the substrate support and the substrate supported thereon by a distance which is short enough to suppress plasma leakage during the plasma processing and to position the end of the surrounding member away from said at least one of the substrate support and the substrate thereon for charging and discharging of the substrate.