The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 1997
Filed:
Dec. 28, 1994
Applicant:
Inventor:
Peter J Klopotek, Framingham, MA (US);
Assignee:
Summit Technology, Inc., Waltham, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61N / ;
U.S. Cl.
CPC ...
606-5 ; 606 10 ; 606 17 ; 606-4 ; 128898 ;
Abstract
Apparatus and methods to modify the intensity distribution of a beam of radiation, such as a laser, and for eroding surfaces with predetermined shapes. A rotatable mask is formed with one or more apertures that have a geometric spiral shape originating substantially the center of rotation on the mask. The mask is insert to the beam for modification of the intensity of that beam, and additionally to form the desired etch pattern on a target surface. In a preferred embodiment, the invention is useful for performing kerotoplasty or keratomileusis.