The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 1997
Filed:
Sep. 26, 1995
Ruriko Tsuneta, Kokubunji, JP;
Hiroshi Kakibayashi, Nagareyama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The composition change and strained structure in a heterointerface or thin film of a multilayer thin film specimen are observed. When the composition change and strained structure are observed, comparison between a dark-field image and a bright-field image and comparison between two dark-field images are required. The position of an objective aperture disposed between the specimen and a detector is moved rapidly so that diffracted wave or transmitted wave corresponding to the dark-field image or bright-field image of a desired plane index is transmitted. As a result, the dark-field image or bright-field image of a desired plane index can be observed correspondingly to the position of the objective aperture.