The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 1997

Filed:

Apr. 03, 1995
Applicant:
Inventors:

Makoto Kato, Nishinomiya, JP;

Yoshiaki Komma, Kyoto, JP;

Shin-ichi Kadowaki, Hirakata, JP;

Yoshikazu Hori, Kobe, JP;

Seiji Nishino, Osaka, JP;

Tetsuo Saimi, Hirakata, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
369112 ; 369 4412 ; 369109 ;
Abstract

Disclosed is a compact optical pick-up head apparatus suitable for mass-production, which comprises a light radiation source, an element composed of photodetector split into a plurality of regions and integrated on the same base, an objective lens for focusing a beam from the above source on an optical disk, a blazed hologram integrated to the support member of the lens, a means for driving the support member to which the objective lens and blazed hologram are integrated in response to an output as servo signal output from the photodetector which receives a diffracted beam produced in such a manner that a return beam reflected or diffracted by the optical disk is incident on the objective lens integrated with the above hologram. The optical pickup apparatus according to the present invention employs a region-split-type phase hologram in which a pair of Flesnel zone plate-like patterns, by which a plurality of diffraction wavefronts having a different focus and the same diffraction order are produced outside an optical-axis, are non-superimposedly formed. The above hologram can be blazed with a pinpoint accuracy by lithography using a few mask patterns synthesized by a computer, and further a more preferably blazing can be realized by the combination of the ion beam etching and the lithography. Accordingly, not only noise caused by an unnecessary diffracted beam component but also the offset of a servo signal can be restrained and the size of the objective lens can be reduced by the integration of the entire optical system, which greatly contributes to the superminiaturization of an optical head.


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